By J. J. Liou, A. Ortiz-Conde, F. Garcia-Sanchez (auth.)

Analysis and layout of MOSFETs: Modeling, Simulation, and ParameterExtraction is the 1st ebook committed totally to a large spectrum of study and layout matters regarding the semiconductor gadget known as metal-oxide semiconductor field-effect transistor (MOSFET). those concerns comprise MOSFET equipment physics, modeling, numerical simulation, and parameter extraction. The dialogue of the appliance of equipment simulation to the extraction of MOSFET parameters, akin to the brink voltage, powerful channel lengths, and sequence resistances, is of specific curiosity to all readers and gives a invaluable studying and reference software for college kids, researchers and engineers.
Analysis and layout of MOSFETs: Modeling, Simulation, and ParameterExtraction, commonly referenced, and containing greater than a hundred and eighty illustrations, is an cutting edge and necessary new publication on MOSFETs layout technology.

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CHAPTER 1. 0 EC > .!. , x direction) at the source and drain junctions for a long-channel MOSFET simulated using twodimensional device simulator MICROTEC. 3 Ilm. 1 V (linear region), and VBS = 0 (no body effect). The same device make-up and bias conditions will be used in Figs. 20. 0 At Source (y=3Jlm) EC E·1 ....... 5 - > Q) >0- .... 1m) EC ....... 5 -> Q) >0- Cl .... --- -- .... 14 : The same energy band diagram presented in Fig. 6 but for a vertical distance up to 40 /lm using a logarithmic scale.

It is worth pointing out that the effective channel length LetT is smaller than the mask channel length Lm but larger than the metallurgical channel length defined by the drain and source junctions (see Fig. 11). 67). 68) lJISL lJISo + €s J F(t\f,V=O) dt\f - €s o J F(t\f,V=V DS) dt\f ] o where t\fs(Y = Ys) :: t\fso and t\fs(Y = Yd) :: t\fSL. This model is also valid for longchannel MOSFETs under all inversion conditions. , the charge-sheet model) [44-46]. 69) where ~s = ~(x = 0-), ~Sd= ~(x = 0+), Q.

74) q N L 23/2 - + A 3D ( (PW SL q NA L D 2 1/2 ( (PWSL - - 1)3/2 - (PWso 1)1/2 - (PWSo - - 1)3/2 ) 1)112 ) ] This model, which is also valid for long-channel MOSFETs under all inversion conditions, has an error of 5 % or less compared the Pao-Sah counterpart. 4 Strong inversion model The drain current models discussed above can be simplified under the strong inversion condition. In this case, the surface band bending increases very little with increasing gate bias, as has been illustrated in Fig.

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